LrgpV1, Main, Exploration, bibRecord, 001075

TDAB-induced DNA plasmid condensation on the surface of a reconstructed boron doped silicon substrate

Identifieur interne : 001075 ( Main/Exploration ); précédent : 001074; suivant : 001076

TDAB-induced DNA plasmid condensation on the surface of a reconstructed boron doped silicon substrate

Auteurs : Antoine Mougin [France, Canada] ; Valéry G. Babak [Russie] ; Frank Palmino [France] ; Eric Beche [France] ; Francis Baros [France] ; Darel J. Hunting [Canada] ; Léon Sanche [Canada] ; Michel Fromm [France]

Source :

Surface science [ 0039-6028 ] ; 2008.

RBID : Pascal:08-0128450

Descripteurs français

Pascal (Inist)
- Condensation, Bore, Matériau dopé, Silicium, Microscopie force atomique, Couche Langmuir Blodgett, Agent surface, B, Si.
Wicri :
- topic : Condensation.

English descriptors

KwdEn :
- Atomic force microscopy, Boron, Doped materials, Langmuir-Blodgett films, Silicon, Surfactants, Vapor condensation.

Abstract

Our study aims at a better control and understanding of the transfer of a complex [DNA supercoiled plasmid - dodecyltrimethylammonium surfactant] layer from a liquid-vapour water interface onto a silicon surface without any additional cross-linker. The production of the complexed layer and its transfer from the aqueous subphase to the substrate is achieved with a Langmuir-Blodgett device. The substrate consists of a reconstructed boron doped silicon substrate with a nanometer-scale roughness. Using X-ray photoelectron spectroscopy and atomic force microscopy measurements, it is shown that the DNA complexes are stretched in a disorderly manner throughout a 2-4nm high net-like structure. This architecture is composed of tilted cationic surfactant molecules bound electrostatically to DNA, which exhibits a characteristic network arrangement with a measured average fiber diameter of about 45 ± 15 nm covering the entire surface. The mechanism of transfer of this layer onto the planar surface of the semi-conductor and the parameters of the process are analysed and illustrated by atomic force microscopy snapshots. The molecular layer exhibits the typical characteristics of a spinodal decomposition pattern or dewetting features. Plasmid molecules appear like long flattened fibers covering the surface, forming holes of various shapes and areas. The cluster-cluster aggregation of the complex structure gets very much denser on the substrate edge. The supercoiled DNA plasmids undergo conformational changes and a high degree of condensation and aggregation is observed. Perspectives and potential applications are considered.

Url:

https://hal.archives-ouvertes.fr/hal-00516052

Affiliations:

Le document en format XML

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<front><div type="abstract" xml:lang="en">Our study aims at a better control and understanding of the transfer of a complex [DNA supercoiled plasmid - dodecyltrimethylammonium surfactant] layer from a liquid-vapour water interface onto a silicon surface without any additional cross-linker. The production of the complexed layer and its transfer from the aqueous subphase to the substrate is achieved with a Langmuir-Blodgett device. The substrate consists of a reconstructed boron doped silicon substrate with a nanometer-scale roughness. Using X-ray photoelectron spectroscopy and atomic force microscopy measurements, it is shown that the DNA complexes are stretched in a disorderly manner throughout a 2-4nm high net-like structure. This architecture is composed of tilted cationic surfactant molecules bound electrostatically to DNA, which exhibits a characteristic network arrangement with a measured average fiber diameter of about 45 ± 15 nm covering the entire surface. The mechanism of transfer of this layer onto the planar surface of the semi-conductor and the parameters of the process are analysed and illustrated by atomic force microscopy snapshots. The molecular layer exhibits the typical characteristics of a spinodal decomposition pattern or dewetting features. Plasmid molecules appear like long flattened fibers covering the surface, forming holes of various shapes and areas. The cluster-cluster aggregation of the complex structure gets very much denser on the substrate edge. The supercoiled DNA plasmids undergo conformational changes and a high degree of condensation and aggregation is observed. Perspectives and potential applications are considered.</div>
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TDAB-induced DNA plasmid condensation on the surface of a reconstructed boron doped silicon substrate

TDAB-induced DNA plasmid condensation on the surface of a reconstructed boron doped silicon substrate

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English descriptors

Abstract

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